The T-4000 series of synthetic quartz glass boasts not only high purity, but also a great number of other highly desirable properties such as superior heat resistance, light transmittance, electrical insulation, and chemical stability. In addition, the properties of synthetic quartz glass and the advanced technology of polishing make photomask substrates suitable for exposure process of minute pattern in the manufacture of large liquid crystal displays (LCDs).
|QZ-TFP 390×610×6T||QZ-TFP 450×550×5T|
|QZ-TFP 500×750×8T||QZ-TFP 620×720×8T|
|QZ-TFP 520×610×10T||QZ-TFP 700×800×8T|
|QZ-TFP 520×800×10T||QZ-TFP 800×920×8T|
|QZ-TFP 800×920×10T||QZ-TFP 700×1100×10T|
CoorsTek’ large photomask substrates have a transmittance of 90% or higher at wavelengths of 250 nm and above.
The exposure process is one of the most important processes which determines the resolution of a liquid crystal panel.
This is the process in which the light is transmitted through the lens and the photomask is projected onto the glass substrate.
Large-scale photomask substrate
The synthetic quartz glass substrate with advanced polishing finish is shipped.
Then, the chrome filme (shading film) is coated to make Blanks.
Next, resist (exposure material) is applied onto the Blanks.
The pattern is made with a drawing machine.
Then, the unnecessary resist is removed from the patterned mask.
Next, the unnecessary chrome is dissolved from the patterned mask.
Finally, the patterned mask is inspected and measured.
After the mask passes inspection, it is washed with pure water and is shipped.