The T-4000 series of synthetic quartz glass boasts not only high purity, but also a great number of other highly desirable properties such as superior heat resistance, light transmittance, electrical insulation, and chemical stability. In addition, the properties of synthetic quartz glass and the advanced technology of polishing make photomask substrates suitable for exposure process of minute pattern in the manufacture of large liquid crystal displays (LCDs).
| Dimensions (mm) | |
|---|---|
| TFT | CF |
| QZ-TFP 390×610×6T | QZ-TFP 450×550×5T |
| QZ-TFP 500×750×8T | QZ-TFP 620×720×8T |
| QZ-TFP 520×610×10T | QZ-TFP 700×800×8T |
| QZ-TFP 520×800×10T | QZ-TFP 800×920×8T |
| QZ-TFP 800×920×10T | QZ-TFP 700×1100×10T |
| QZ-TFP 850×1200×10T | |
| QZ-TFP 850×1400×10T | |
| QZ-TFP 1220×1400×13T | |
m, defect of the appearance: ≪2m)
CoorsTek’ large photomask substrates have a transmittance of 90% or higher at wavelengths of 250 nm and above.
The exposure process is one of the most important processes which determines the resolution of a liquid crystal panel.
This is the process in which the light is transmitted through the lens and the photomask is projected onto the glass substrate.
Proximity system
Large-scale photomask substrate
The synthetic quartz glass substrate with advanced polishing finish is shipped.
Blanks
Then, the chrome filme (shading film) is coated to make Blanks.
Resist Coating
Next, resist (exposure material) is applied onto the Blanks.
Drawing
The pattern is made with a drawing machine.
Developing
Then, the unnecessary resist is removed from the patterned mask.
Etching
Next, the unnecessary chrome is dissolved from the patterned mask.
Inspection/measuring
Finally, the patterned mask is inspected and measured.
Washing/shipping
After the mask passes inspection, it is washed with pure water and is shipped.
