In the semiconductor industry, the excellent properties of our quartz and silica glass can be fully utilized in such products as crucibles for pulling single crystal silicon; bell jars for epitaxial growth; process tubes, boats and other jigs for heat treatment such heat treatment as oxidation and diffusion; and cleaning baths. In addition, such properties of synthetic quartz glass as its high purity and low thermal expansion make it suitable for photomask materials essential to LSI lithography processes.
In the semiconductor industry, the excellent properties of our quartz and silica glass can be fully utilized in such products as crucibles for pulling single crystal silicon; bell jars for epitaxial growth; process tubes, boats and other jigs for heat treatment such heat treatment as oxidation and diffusion; and cleaning baths. In addition, such properties of synthetic quartz glass as its high purity and low thermal expansion make it suitable for photomask materials essential to LSI lithography processes.
The T-4000 series of synthetic quartz glass is extremely pure, with metal impurities less than one-tenth that of ordinary quartz glass. The glass is highly homogenous
and contains few striae or bubbles, thus yielding excellent ultraviolet transmittance. Therefore, it is widely used as substrates for photomasks in the manufacture of
large liquid crystal displays (LCDs).
GLASSUN refractories consist of mainly high purity fused silica materials. The major products are divided roughly into the GLASSUN Series, shaped by slip casting, the GLASSUN CASTABLE Series of monolithic refractories, and GLASSUN CEMENT.
GLASSUN has many superior properties, including high resistance to thermal shock due to a very low thermal expansion rate, low thermal conductivity, and high corrosion resistance to chemical substances and molten metals. Moreover, it can be fabricated into various sizes, including very large sizes, as well as into complex shapes.
